发明申请
US20100041172A1 METHOD OF FABRICATING SEMICONDUCTOR LIGHT EMITTING DEVICE 审中-公开
制造半导体发光器件的方法

  • 专利标题: METHOD OF FABRICATING SEMICONDUCTOR LIGHT EMITTING DEVICE
  • 专利标题(中): 制造半导体发光器件的方法
  • 申请号: US12603286
    申请日: 2009-10-21
  • 公开(公告)号: US20100041172A1
    公开(公告)日: 2010-02-18
  • 发明人: Kuo-Hsin Huang
  • 申请人: Kuo-Hsin Huang
  • 申请人地址: TW Taichung County
  • 专利权人: HIGH POWER OPTOELECTRONICS, INC.
  • 当前专利权人: HIGH POWER OPTOELECTRONICS, INC.
  • 当前专利权人地址: TW Taichung County
  • 优先权: TW095121776 20060616; TW096113152 20070413
  • 主分类号: H01L33/00
  • IPC分类号: H01L33/00
METHOD OF FABRICATING SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要:
The present invention provides a method for fabricating a flip chip semiconductor light-emitting device which includes a substrate and a semiconductor multi-layer structure. The method of the invention includes the steps of: (a) forming a semiconductor multi-layer structure on a first substrate; (b) flip-chip bonding the semiconductor multi-layer structure on a second substrate; (c) removing the first substrate, so as to expose a first surface of the semiconductor multi-layer structure; and (d) forming a plurality of protrusions, arranged periodically, on the first surface. Particularly, the protrusions comprise a first protrusion and a second protrusion adjacent to the first protrusion, the first protrusion and the second protrusion both having a peak, and the second surface having a bottom, wherein the ratio of the vertical distance between one of the peaks and the bottom and the horizontal distance between the two peaks is in between 0.01 and 10.
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