发明申请
- 专利标题: METHOD OF FABRICATING SEMICONDUCTOR LIGHT EMITTING DEVICE
- 专利标题(中): 制造半导体发光器件的方法
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申请号: US12603286申请日: 2009-10-21
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公开(公告)号: US20100041172A1公开(公告)日: 2010-02-18
- 发明人: Kuo-Hsin Huang
- 申请人: Kuo-Hsin Huang
- 申请人地址: TW Taichung County
- 专利权人: HIGH POWER OPTOELECTRONICS, INC.
- 当前专利权人: HIGH POWER OPTOELECTRONICS, INC.
- 当前专利权人地址: TW Taichung County
- 优先权: TW095121776 20060616; TW096113152 20070413
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
The present invention provides a method for fabricating a flip chip semiconductor light-emitting device which includes a substrate and a semiconductor multi-layer structure. The method of the invention includes the steps of: (a) forming a semiconductor multi-layer structure on a first substrate; (b) flip-chip bonding the semiconductor multi-layer structure on a second substrate; (c) removing the first substrate, so as to expose a first surface of the semiconductor multi-layer structure; and (d) forming a plurality of protrusions, arranged periodically, on the first surface. Particularly, the protrusions comprise a first protrusion and a second protrusion adjacent to the first protrusion, the first protrusion and the second protrusion both having a peak, and the second surface having a bottom, wherein the ratio of the vertical distance between one of the peaks and the bottom and the horizontal distance between the two peaks is in between 0.01 and 10.
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