发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
-
申请号： US12613846申请日： 2009-11-06
-
公开(公告)号： US20100044593A1公开(公告)日： 2010-02-25
- 发明人: Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
- 申请人： Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
公开/授权文献
- US08138486B2 Lithographic apparatus and device manufacturing method 公开/授权日：2012-03-20