Invention Application
- Patent Title: PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY
- Patent Title (中): 用于生产半导体光刻胶的聚合物的方法
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Application No.: US12519371Application Date: 2007-12-20
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Publication No.: US20100048848A1Publication Date: 2010-02-25
- Inventor: Takanori Yamagishi , Ichiro Kato , Satoshi Yamaguchi , Kouzo Osaki , Yasuo Shibata , Isao Magara , Hideki Omori , Kensuke Iuchi
- Applicant: Takanori Yamagishi , Ichiro Kato , Satoshi Yamaguchi , Kouzo Osaki , Yasuo Shibata , Isao Magara , Hideki Omori , Kensuke Iuchi
- Applicant Address: JP Chuo-ku
- Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee Address: JP Chuo-ku
- Priority: JP2006-346454 20061222
- International Application: PCT/JP07/01447 WO 20071220
- Main IPC: C08F224/00
- IPC: C08F224/00
Abstract:
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot.The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.
Public/Granted literature
- US08030419B2 Process for producing polymer for semiconductor lithography Public/Granted day:2011-10-04
Information query
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