发明申请
- 专利标题： WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY
- 专利标题（中）： 具有可调节电阻率的加工装置
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申请号： US12204079申请日： 2008-09-04
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公开(公告)号： US20100053841A1公开(公告)日： 2010-03-04
- 发明人: David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
- 申请人： David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
- 申请人地址： US NY Albany
- 专利权人： MOMENTIVE PERFORMANCE MATERIALS INC.
- 当前专利权人： MOMENTIVE PERFORMANCE MATERIALS INC.
- 当前专利权人地址： US NY Albany
- 主分类号： H01L21/683
- IPC分类号： H01L21/683
摘要：
An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.