发明申请
- 专利标题: EXPOSURE DEVICE AND EXPOSURE METHOD
- 专利标题(中): 曝光装置和曝光方法
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申请号: US12548154申请日: 2009-08-26
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公开(公告)号: US20100055584A1公开(公告)日: 2010-03-04
- 发明人: Takashi SATO , Kazuya Fukuhara , Yumi Nakajima
- 申请人: Takashi SATO , Kazuya Fukuhara , Yumi Nakajima
- 优先权: JP2008-220804 20080829
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G03F7/20 ; G03B27/54
摘要:
An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective mask with an alignment light and an optical element having a structure that a light path of the exposure light extending from the alignment light source to the reflective mask shares at least part in common with a light path of the alignment light extending from the alignment light source to the reflective mask.
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