发明申请
US20100055584A1 EXPOSURE DEVICE AND EXPOSURE METHOD 审中-公开
曝光装置和曝光方法

EXPOSURE DEVICE AND EXPOSURE METHOD
摘要:
An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective mask with an alignment light and an optical element having a structure that a light path of the exposure light extending from the alignment light source to the reflective mask shares at least part in common with a light path of the alignment light extending from the alignment light source to the reflective mask.
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