发明申请
US20100055820A1 METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR OPTICAL DEVICE AND EPITAXIAL WAFER
失效
用于生产氮化物半导体光学器件和外延晶体的方法
- 专利标题: METHOD FOR PRODUCING NITRIDE SEMICONDUCTOR OPTICAL DEVICE AND EPITAXIAL WAFER
- 专利标题(中): 用于生产氮化物半导体光学器件和外延晶体的方法
-
申请号: US12539887申请日: 2009-08-12
-
公开(公告)号: US20100055820A1公开(公告)日: 2010-03-04
- 发明人: Katsushi Akita , Yohei Enya , Takashi Kyono , Takamichi Sumitomo , Yusuke Yoshizumi , Masaki Ueno , Takao Nakamura
- 申请人: Katsushi Akita , Yohei Enya , Takashi Kyono , Takamichi Sumitomo , Yusuke Yoshizumi , Masaki Ueno , Takao Nakamura
- 申请人地址: JP Osaka-shi
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2008-217081 20080826
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
In step S106, an InXGa1-XN well layer is grown on a semipolar main surface between times t4 and t5 while a temperature in a growth furnace is maintained at temperature TW. In step S107, immediately after completion of the growth of the well layer, the growth of a protective layer covering the main surface of the well layer is initiated at temperature TW. The protective layer is composed of a gallium nitride-based semiconductor with a band gap energy that is higher than that of the well layer and equal to or less than that of a barrier layer. In step S108, the temperature in the furnace is changed from temperatures TW to TB before the barrier layer growth. The barrier layer composed of the gallium nitride-based semiconductor is grown on the protective layer between times t8 and t9 while the temperature in the furnace is maintained at temperature TB.