发明申请
- 专利标题: TWO-PHOTON ABSORPTION MATERIAL AND APPLICATION THEREOF
- 专利标题(中): 两光子吸收材料及其应用
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申请号: US12423475申请日: 2009-04-14
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公开(公告)号: US20100056775A1公开(公告)日: 2010-03-04
- 发明人: Tatsuya TOMURA , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Hisamitsu Kamezaki
- 申请人: Tatsuya TOMURA , Tsutomu Sato , Takeshi Miki , Mikiko Takada , Hisamitsu Kamezaki
- 优先权: JP2008-217276 20080826; JP2009-009719 20090120
- 主分类号: C09B47/00
- IPC分类号: C09B47/00
摘要:
A two-photon absorption material represented by the following General Formula (I): where R1 to R8 each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkyl group; one to three of X1 to X4 each represent a substituted or unsubstituted amino group, a substituted or unsubstituted aminophenyl group, a substituted or unsubstituted dialkylaminophenyl group, a substituted or unsubstituted N,N-diphenyl-aminophenyl group, a substituted or unsubstituted indolyl group, or a substituted or unsubstituted azulenyl group, and the other represents or the others each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, a substituted or unsubstituted pyridinyl group, a substituted or unsubstituted alkyl group or a perhalogenoalkyl group; and M represents two hydrogen atoms or a divalent, trivalent or tetravalent metal atom which may have oxygen or halogen.
公开/授权文献
- US08207330B2 Two-photon absorption material and application thereof 公开/授权日:2012-06-26
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