发明申请
- 专利标题: NANOWIRE COMPRISING SILICON RICH OXIDE AND METHOD FOR PRODUCING THE SAME
- 专利标题(中): 包含硅氧化物的纳米颗粒及其制造方法
-
申请号: US12350709申请日: 2009-01-08
-
公开(公告)号: US20100065809A1公开(公告)日: 2010-03-18
- 发明人: Eun Kyung LEE , Byoung Lyong CHOI , Gyeong Su PARK , Jai Yong HAN
- 申请人: Eun Kyung LEE , Byoung Lyong CHOI , Gyeong Su PARK , Jai Yong HAN
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2008-0076325 20080805
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L21/20
摘要:
Disclosed herein is a nanowire including silicon rich oxide and a method for producing the same. The nanowire exhibits excellent electrically conducting properties and optical characteristics, and therefore is effectively used in a variety of applications including, for example, solar cells, sensors, photodetectors, light emitting diodes, laser diodes, EL devices, PL devices, CL devices, FETs, CTFs, surface plasmon waveguides, MOS capacitors and the like.
公开/授权文献
信息查询
IPC分类: