Invention Application
- Patent Title: Method for producing at least one porous layer
- Patent Title (中): 生产至少一个多孔层的方法
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Application No.: US12311707Application Date: 2007-10-10
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Publication No.: US20100065895A1Publication Date: 2010-03-18
- Inventor: Richard Fix , Oliver Wolst , Markus Widenmeyer , Alexander Martin
- Applicant: Richard Fix , Oliver Wolst , Markus Widenmeyer , Alexander Martin
- Priority: DE102006047928.9 20061010
- International Application: PCT/EP2007/060760 WO 20071010
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/44 ; H01L21/469

Abstract:
A method for producing at least one porous layer on a substrate, whereby a suspension, which contains particles from a layer-forming material or molecular precursors of the layer-forming material, as well as at least one organic component, is applied to the substrate, the precursors of the layer-forming material are subsequently reacted to produce the layer-forming material following application to the substrate, in a next step, the particles from the layer-forming material are sintered, and the at least one organic component is subsequently removed. Also, a field-effect transistor having at least one gate electrode, the gate electrode having an electrically conductive, porous coating which was applied in accordance with the method.
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