发明申请
- 专利标题: BEAM IRRADIATION APPARATUS
- 专利标题(中): 光束辐射装置
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申请号: US12047038申请日: 2008-03-12
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公开(公告)号: US20100073750A1公开(公告)日: 2010-03-25
- 发明人: Atsushi YAMAGUCHI , Masato Yamada , Yoshiaki Maeno
- 申请人: Atsushi YAMAGUCHI , Masato Yamada , Yoshiaki Maeno
- 申请人地址: JP Moriguchi-shi JP Tokyo
- 专利权人: Sanyo Electric Co., Ltd.,Sanyo Optec Design Co., Ltd.
- 当前专利权人: Sanyo Electric Co., Ltd.,Sanyo Optec Design Co., Ltd.
- 当前专利权人地址: JP Moriguchi-shi JP Tokyo
- 优先权: JP2007-62924 20070313
- 主分类号: G02B26/10
- IPC分类号: G02B26/10
摘要:
A light refracting element formed in parallel plate shape is attached to a support shaft of a mirror holder, a semiconductor laser and a PSD are disposed at positions between which the light refracting element is sandwiched. The light refracting element is rotated by rotation of the mirror holder, and whereby a laser beam irradiation position is changed on a light acceptance surface of PSD. The laser beam irradiation position on a light acceptance surface corresponds to the mirror rotation position, so that the mirror rotation position and a laser beam scanning position in a target area can be detected based on an output from the PSD.
公开/授权文献
- US07773277B2 Beam irradiation apparatus 公开/授权日:2010-08-10
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