发明申请
- 专利标题： Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device
- 专利标题（中）： 极紫外光源装置，用于极紫外光源装置的激光光源装置以及用于极紫外光源装置调整激光光源装置的方法
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申请号： US12560864申请日： 2009-09-16
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公开(公告)号： US20100078577A1公开(公告)日： 2010-04-01
- 发明人: Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
- 申请人： Masato Moriya , Hideo Hoshino , Osamu Wakabayashi , Hakaru Mizoguchi
- 申请人地址： JP Tokyo
- 专利权人： Gigaphoton Inc.
- 当前专利权人： Gigaphoton Inc.
- 当前专利权人地址： JP Tokyo
- 优先权： JPJP2008-240915 20080919; JPJP2009-008001 20090116; JPJP2009-212003 20090914
- 主分类号： G21K5/00
- IPC分类号： G21K5/00 ; H01S3/10
摘要：
An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
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