发明申请
US20100081089A1 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN
有权
包含使用MACROMONOMER作为ALKALI可溶树脂制备的聚合物的感光树脂组合物
- 专利标题： PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN
- 专利标题（中）： 包含使用MACROMONOMER作为ALKALI可溶树脂制备的聚合物的感光树脂组合物
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申请号： US12450661申请日： 2008-04-11
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公开(公告)号： US20100081089A1公开(公告)日： 2010-04-01
- 发明人: Han-Soo Kim , Min-Young Lim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim , Kwang-Han Park
- 申请人： Han-Soo Kim , Min-Young Lim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim , Kwang-Han Park
- 优先权： KR10-2007-0035389 20070411
- 国际申请： PCT/KR2008/002055 WO 20080411
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F224/00 ; C08F226/10 ; C08F226/12 ; C08F226/06 ; C08F222/40 ; C08F222/06 ; C08F4/04 ; C08F4/34 ; C08F4/28 ; C08F4/32
摘要：
The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
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