发明申请
- 专利标题: PROJECTION ASSEMBLY AND LITHOGRAPHIC APPARATUS
- 专利标题(中): 投影装配和平版印刷设备
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申请号: US12574573申请日: 2009-10-06
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公开(公告)号: US20100089712A1公开(公告)日: 2010-04-15
- 发明人: Hans Butler , Cornelius Adrianus,Lambertus De Hoon
- 申请人: Hans Butler , Cornelius Adrianus,Lambertus De Hoon
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: F16F7/10
- IPC分类号: F16F7/10 ; G03B27/42
摘要:
A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, the active damping subsystem including a sensor to measure a position of the interface damping mass, an electromagnetic actuator to exert a force on the interface damping mass, and a controller to drive the electromagnetic actuator based on a signal provided by the sensor, the active damping subsystem including a reaction mass for the electromagnetic actuator to exert a counterforce upon based on the signal provided by the first sensor.
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