Invention Application
- Patent Title: DOUBLE-LAYER GRATING
- Patent Title (中): 双层磨砂
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Application No.: US12579134Application Date: 2009-10-14
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Publication No.: US20100091369A1Publication Date: 2010-04-15
- Inventor: John Hoose
- Applicant: John Hoose
- Applicant Address: US NY Fairport
- Assignee: LUMELLA INC.
- Current Assignee: LUMELLA INC.
- Current Assignee Address: US NY Fairport
- Main IPC: G02B5/18
- IPC: G02B5/18 ; B44C1/22

Abstract:
A double-layer grating structure for efficient retroreflection of incident radiation and efficient transmission of the undiffracted incident radiation is disclosed. The grating is constructed of two spaced-apart layers of periodically arranged metal stripes, wherein the stripes in one layer overlap with gaps between the stripes in the second layer. The layers are encapsulated with a dielectric material. A method for producing such grating is also described.
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