Invention Application
US20100091369A1 DOUBLE-LAYER GRATING 审中-公开
双层磨砂

  • Patent Title: DOUBLE-LAYER GRATING
  • Patent Title (中): 双层磨砂
  • Application No.: US12579134
    Application Date: 2009-10-14
  • Publication No.: US20100091369A1
    Publication Date: 2010-04-15
  • Inventor: John Hoose
  • Applicant: John Hoose
  • Applicant Address: US NY Fairport
  • Assignee: LUMELLA INC.
  • Current Assignee: LUMELLA INC.
  • Current Assignee Address: US NY Fairport
  • Main IPC: G02B5/18
  • IPC: G02B5/18 B44C1/22
DOUBLE-LAYER GRATING
Abstract:
A double-layer grating structure for efficient retroreflection of incident radiation and efficient transmission of the undiffracted incident radiation is disclosed. The grating is constructed of two spaced-apart layers of periodically arranged metal stripes, wherein the stripes in one layer overlap with gaps between the stripes in the second layer. The layers are encapsulated with a dielectric material. A method for producing such grating is also described.
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