发明申请
- 专利标题: THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 薄膜晶体管及其制造方法
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申请号: US12423829申请日: 2009-04-15
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公开(公告)号: US20100096637A1公开(公告)日: 2010-04-22
- 发明人: Shunpei Yamazaki , Yuji Egi , Shinya Sasagawa , Motomu Kurata
- 申请人: Shunpei Yamazaki , Yuji Egi , Shinya Sasagawa , Motomu Kurata
- 申请人地址: JP Atsugi-shi
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP2008-109629 20080418
- 主分类号: H01L29/786
- IPC分类号: H01L29/786 ; H01L21/336
摘要:
Off current of a thin film transistor is reduced, and on current of the thin film transistor is increased, and variation in electric characteristics is reduced. As a structure of semiconductor layers which form a channel formation region of a thin film transistor, a first semiconductor layer including a plurality of crystalline regions is provided on a gate insulating layer side; a second semiconductor layer having an amorphous structure is provided on a source region and drain region side; an insulating layer with a thickness small enough to allow carrier travel is provided between the first semiconductor layer and the second semiconductor layer. The first semiconductor layer is in contact with the gate insulating layer. The second semiconductor layer is provided on an opposite side to a face of the first semiconductor layer which is in contact with the gate insulating layer.
公开/授权文献
- US08525170B2 Thin film transistor and manufacturing method thereof 公开/授权日:2013-09-03