发明申请
- 专利标题: OPTICAL WAVE INTERFERENCE MEASURING APPARATUS
- 专利标题(中): 光波干扰测量装置
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申请号: US12571993申请日: 2009-10-01
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公开(公告)号: US20100097619A1公开(公告)日: 2010-04-22
- 发明人: Zongtao GE , Hideo KANDA , Takayuki SAITO , Noboru KOIZUMI
- 申请人: Zongtao GE , Hideo KANDA , Takayuki SAITO , Noboru KOIZUMI
- 优先权: JPP2008-270151 20081020; JPP2009-207890 20090909
- 主分类号: G01B11/02
- IPC分类号: G01B11/02
摘要:
The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light that travels while being converged by a Mirau objective interference optical system is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.
公开/授权文献
- US07982882B2 Optical wave interference measuring apparatus 公开/授权日:2011-07-19