Invention Application
- Patent Title: SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A SPECTRAL REFERENCE
- Patent Title (中): 使用永久窗口作为光谱参考的工件的光谱计量
-
Application No.: US12388222Application Date: 2009-02-18
-
Publication No.: US20100106444A1Publication Date: 2010-04-29
- Inventor: EDGAR GENIO , EDWARD W. BUDIARTO
- Applicant: EDGAR GENIO , EDWARD W. BUDIARTO
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: G01J3/40
- IPC: G01J3/40 ; G01J3/30 ; G06F19/00
Abstract:
In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.
Public/Granted literature
- US07911603B2 Spectrometric metrology of workpieces using a permanent window as a spectral reference Public/Granted day:2011-03-22
Information query
