发明申请
- 专利标题: MULTI-AXIS DIFFRACTION GRATING
- 专利标题(中): 多轴衍射光栅
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申请号: US12614053申请日: 2009-11-06
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公开(公告)号: US20100116156A1公开(公告)日: 2010-05-13
- 发明人: Louis M. Spoto , Dean J. Randazzo , Matthew J. Deschner
- 申请人: Louis M. Spoto , Dean J. Randazzo , Matthew J. Deschner
- 申请人地址: US IL Glenview
- 专利权人: Illinois Tool Works Inc.
- 当前专利权人: Illinois Tool Works Inc.
- 当前专利权人地址: US IL Glenview
- 主分类号: B31F1/07
- IPC分类号: B31F1/07 ; G03F7/20
摘要:
An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefineable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light.
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