发明申请
- 专利标题： NANO-ARRAY AND FABRICATION METHOD THEREOF
- 专利标题（中）： 纳米阵列及其制造方法
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申请号： US12628847申请日： 2009-12-01
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公开(公告)号： US20100120196A1公开(公告)日： 2010-05-13
- 发明人: Chih-Chiang Chao , Po-Ling Shiao , Mei-Chun Lai
- 申请人： Chih-Chiang Chao , Po-Ling Shiao , Mei-Chun Lai
- 申请人地址： TW Hsinchu
- 专利权人： Industrial Technology Research Institute
- 当前专利权人： Industrial Technology Research Institute
- 当前专利权人地址： TW Hsinchu
- 优先权： TW94146967 20051228
- 主分类号： H01L51/40
- IPC分类号： H01L51/40 ; B29C59/02
摘要：
The invention provides a method for fabricating a nano-array comprising the following steps. A template with a plurality of nano-holes is provided. A polymer is embossed by the template to integrally form a plurality of nano-protrusions thereon, and demolding to reveal the nano-protrusions. The nano-protrusion has a concave or convex top surface.
公开/授权文献
- US08198128B2 Nano-array and fabrication method thereof 公开/授权日：2012-06-12
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