发明申请
- 专利标题: Method of Positioning Patterns from Block Copolymer Self-Assembly
- 专利标题(中): 从嵌段共聚物自组装定位图案的方法
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申请号: US12482583申请日: 2009-06-11
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公开(公告)号: US20100120252A1公开(公告)日: 2010-05-13
- 发明人: Ho-Cheol Kim , Charles T. Rettner , Sang-Min Park
- 申请人: Ho-Cheol Kim , Charles T. Rettner , Sang-Min Park
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L21/465
- IPC分类号: H01L21/465
摘要:
A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.