发明申请
- 专利标题： METHOD FOR PRODUCING A MATERIAL FOR CHEMICAL VAPOR DEPOSITION
- 专利标题（中）： 生产化学气相沉积材料的方法
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申请号： US12689852申请日： 2010-01-19
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公开(公告)号： US20100126351A1公开(公告)日： 2010-05-27
- 发明人: Masaru HOSOKAWA , Masakatsu MATSUSHITA , Satoshi NAKAGAWA
- 申请人： Masaru HOSOKAWA , Masakatsu MATSUSHITA , Satoshi NAKAGAWA
- 申请人地址： JP Tokyo
- 专利权人： ADEKA CORPORATION
- 当前专利权人： ADEKA CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2004-155543 20040526
- 主分类号： B01D46/00
- IPC分类号： B01D46/00
摘要：
A material for chemical vapor deposition of the present invention contains a precursor composed of a metal compound, and has 100 or less particles having a size of 0.5 μm or more in 1 ml, in particle measurement by a light scattering type submerged particle detector in a liquid phase. A thin film can be prevented from being contaminated by particles even when a highly degradable metal compound is used as the precursor.
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