The apparatus for manufacturing solid particles at a nano level includes a chamber for isolation from an external space, a monoaxial rotary disk disposed in the chamber, a receiving surface at one end of the rotary disk, a material supply mechanism for supplying the material to the receiving surface, a rotary mechanism for applying a centrifugal force to the rotary disk so that the raw material supplied to the receiving surface is produced into a thin film and atomized and scattered from the outer peripheral edge, and a control mechanism for the temperature in the chamber that controls the temperature at least at the outer peripheral edge of the receiving surface and on the side nearer to the center of rotation to a temperature lower than a volatilization temperature of a volatile solvent and the temperature at the outer side therefrom to the volatilization temperature of the volatile solvent or higher.