发明申请
- 专利标题： PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY
- 专利标题（中）： 投影曝光系统
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申请号： US12623744申请日： 2009-11-23
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公开(公告)号： US20100134768A1公开(公告)日： 2010-06-03
- 发明人: Jochen Hetzler , Toralf Gruner
- 申请人： Jochen Hetzler , Toralf Gruner
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT AG
- 当前专利权人： CARL ZEISS SMT AG
- 当前专利权人地址： DE Oberkochen
- 优先权： DE102007027200.8 20070613
- 主分类号： G03B27/68
- IPC分类号： G03B27/68
摘要：
The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.