发明申请
US20100137516A1 IMPACT-RESISTANT COMPOSITION BASED ON A POLYAMIDE RESIN AND ON A BLEND OF AT LEAST ONE GRAFT COPOLYMER WITH POLYAMIDE BLOCKS AND A LOW-DENSITY ETHYLENE POLYMER
有权
基于聚酰胺树脂和至少一种具有聚酰胺嵌段共聚物和低密度乙烯聚合物的混合物的抗冲击组合物
- 专利标题: IMPACT-RESISTANT COMPOSITION BASED ON A POLYAMIDE RESIN AND ON A BLEND OF AT LEAST ONE GRAFT COPOLYMER WITH POLYAMIDE BLOCKS AND A LOW-DENSITY ETHYLENE POLYMER
- 专利标题(中): 基于聚酰胺树脂和至少一种具有聚酰胺嵌段共聚物和低密度乙烯聚合物的混合物的抗冲击组合物
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申请号: US12445082申请日: 2007-10-11
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公开(公告)号: US20100137516A1公开(公告)日: 2010-06-03
- 发明人: Marius Hert , Alain Bouilloux , Thibaut Montanari , Thomas Fine
- 申请人: Marius Hert , Alain Bouilloux , Thibaut Montanari , Thomas Fine
- 申请人地址: FR COLOMBES
- 专利权人: ARKEMA FRANCE
- 当前专利权人: ARKEMA FRANCE
- 当前专利权人地址: FR COLOMBES
- 优先权: FR06.54250 20061012
- 国际申请: PCT/FR07/52118 WO 20071011
- 主分类号: C08L51/06
- IPC分类号: C08L51/06 ; C08L77/00
摘要:
The invention relates to a composition based on an impact-resistant polyamide thermoplastic resin, comprising, as a blend: from 60 to 98% by weight of polyamide resin (A) and from 2 to 40% by weight of a blend of at least one polyamide-block graft copolymer (B) composed of a polyolefin backbone and of at least one polyamide graft in which the grafts are attached to the backbone by the residues of an unsaturated monomer (X) having a functional group capable of reacting with an amine-terminated polyamide, the residues of the unsaturated monomer (X) being attached to the backbone by grafting or copolymerization via its double bond, and of a non-reactive ethylenic polymer (C) that is miscible with (B) and has a density of less than 0.960 g/cm3. This composition has improved impact resistance properties and also satisfactory melt flow.The invention also relates to the method of obtaining said composition and also to its use for manufacturing products or parts obtained by injection moulding or extrusion.
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