发明申请
- 专利标题: ARC RECOVERY WITH OVER-VOLTAGE PROTECTION FOR PLASMA-CHAMBER POWER SUPPLIES
- 专利标题(中): 电弧恢复与等离子体电源的过电压保护
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申请号: US12631735申请日: 2009-12-04
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公开(公告)号: US20100140231A1公开(公告)日: 2010-06-10
- 发明人: Milan Ilic
- 申请人: Milan Ilic
- 主分类号: B23K9/06
- IPC分类号: B23K9/06
摘要:
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
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