发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： LITHOGRAPHIC装置和装置制造方法
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申请号： US12709151申请日： 2010-02-19
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公开(公告)号： US20100141918A1公开(公告)日： 2010-06-10
- 发明人: Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- 申请人： Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP02251933.4 20020318
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
公开/授权文献
- US08279405B2 Lithographic apparatus and device manufacturing method 公开/授权日：2012-10-02