发明申请
US20100149511A1 Illumination optical system, exposure apparatus, and exposure method
审中-公开
照明光学系统,曝光装置和曝光方法
- 专利标题: Illumination optical system, exposure apparatus, and exposure method
- 专利标题(中): 照明光学系统,曝光装置和曝光方法
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申请号: US12656822申请日: 2010-02-17
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公开(公告)号: US20100149511A1公开(公告)日: 2010-06-17
- 发明人: Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
- 申请人: Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2002-351186 20021203; JP2003-201079 20030724; JP2003-338447 20030929
- 主分类号: G03B27/72
- IPC分类号: G03B27/72
摘要:
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.
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