发明申请
- 专利标题: TAPE-BASED EPITAXIAL LIFT OFF APPARATUSES AND METHODS
- 专利标题(中): 基于胶带的外延提升装置和方法
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申请号: US12640796申请日: 2009-12-17
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公开(公告)号: US20100151689A1公开(公告)日: 2010-06-17
- 发明人: Thomas Gmitter , Gang He , Melissa Archer , Andreas Hegedus
- 申请人: Thomas Gmitter , Gang He , Melissa Archer , Andreas Hegedus
- 申请人地址: US CA Santa Clara
- 专利权人: ALTA DEVICES, INC.
- 当前专利权人: ALTA DEVICES, INC.
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L21/306
- IPC分类号: H01L21/306 ; C23F1/08
摘要:
Embodiments of the invention generally relate to apparatuses and methods for producing epitaxial thin films and devices by epitaxial lift off (ELO) processes. In one embodiment, a method for forming thin film devices during an ELO process is provided which includes coupling a plurality of substrates to an elongated support tape, wherein each substrate contains an epitaxial film disposed over a sacrificial layer disposed over a wafer, exposing the substrates to an etchant during an etching process while moving the elongated support tape, and etching the sacrificial layers and peeling the epitaxial films from the wafers while moving the elongated support tape. Embodiments also include several apparatuses, continuous-type as well as a batch-type apparatuses, for forming the epitaxial thin films and devices, including an apparatus for removing the support tape and epitaxial films from the wafers on which the epitaxial films were grown.
公开/授权文献
- US09165805B2 Tape-based epitaxial lift off apparatuses and methods 公开/授权日:2015-10-20
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