发明申请
US20100154870A1 Use of Pattern Recognition to Align Patterns in a Downstream Process
审中-公开
使用模式识别在下游过程中对齐模式
- 专利标题: Use of Pattern Recognition to Align Patterns in a Downstream Process
- 专利标题(中): 使用模式识别在下游过程中对齐模式
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申请号: US12487046申请日: 2009-06-18
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公开(公告)号: US20100154870A1公开(公告)日: 2010-06-24
- 发明人: Nicholas Bateman , Paul Murphy
- 申请人: Nicholas Bateman , Paul Murphy
- 主分类号: H01L31/04
- IPC分类号: H01L31/04 ; H01L31/18 ; H01L21/265
摘要:
An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to maintain this alignment. This information can also be fed back to the ion implantation equipment to modify the implant parameters. These techniques can also be used in other ion implanter applications.
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