发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- 专利标题(中): 半导体器件及其制造方法
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申请号: US12714192申请日: 2010-02-26
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公开(公告)号: US20100155962A1公开(公告)日: 2010-06-24
- 发明人: Daisuke INOUE , Takahiro Nakano
- 申请人: Daisuke INOUE , Takahiro Nakano
- 申请人地址: JP Osaka
- 专利权人: PANASONIC CORPORATION
- 当前专利权人: PANASONIC CORPORATION
- 当前专利权人地址: JP Osaka
- 优先权: JP2008-302389 20081127
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L21/768
摘要:
A semiconductor device includes a semiconductor substrate, a diffusion region provided on a surface portion of a first surface of the semiconductor substrate, a first line provided on the first surface of the semiconductor substrate, a through-hole penetrating the semiconductor substrate in the thickness direction, and a through-hole electrode provided in the through-hole, and contacting a rear surface of the first line and extending to a second surface opposite the first surface of the semiconductor substrate. The semiconductor device further includes a recess provided on the second surface of the semiconductor substrate and a second line provided in the recess and electrically connected to the through-hole electrode.
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