发明申请
US20100155962A1 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME 审中-公开
半导体器件及其制造方法

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
摘要:
A semiconductor device includes a semiconductor substrate, a diffusion region provided on a surface portion of a first surface of the semiconductor substrate, a first line provided on the first surface of the semiconductor substrate, a through-hole penetrating the semiconductor substrate in the thickness direction, and a through-hole electrode provided in the through-hole, and contacting a rear surface of the first line and extending to a second surface opposite the first surface of the semiconductor substrate. The semiconductor device further includes a recess provided on the second surface of the semiconductor substrate and a second line provided in the recess and electrically connected to the through-hole electrode.
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