发明申请
- 专利标题： HIGH REPELLENCY MATERIALS VIA NANOTOPOGRAPHY AND POST TREATMENT
- 专利标题（中）： 高通量材料通过纳刻和后处理
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申请号： US12343909申请日： 2008-12-24
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公开(公告)号： US20100159195A1公开(公告)日： 2010-06-24
- 发明人: Roger B. Quincy, III , Ali Yahiaoui
- 申请人： Roger B. Quincy, III , Ali Yahiaoui
- 主分类号： B32B3/00
- IPC分类号： B32B3/00 ; B05D3/00
摘要：
A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like nanotopography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process.
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