发明申请
- 专利标题： SUBSTRATE TRANSFER ROBOT, SUBSTRATE TRANSFER APPARATUS INCLUDING THE SAME, AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLUDING THE SAME
- 专利标题（中）： 基板传送机器人，包括它们的基板传送装置和包括它们的半导体制造装置
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申请号： US12560423申请日： 2009-09-16
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公开(公告)号： US20100161124A1公开(公告)日： 2010-06-24
- 发明人: Yoshiki KIMURA
- 申请人： Yoshiki KIMURA
- 申请人地址： JP Kitakyushu-shi
- 专利权人： KABUSHIKI KAISHA YASKAWA DENKI
- 当前专利权人： KABUSHIKI KAISHA YASKAWA DENKI
- 当前专利权人地址： JP Kitakyushu-shi
- 优先权： JP2008-322481 20081218; JP2009-144281 20090617
- 主分类号： G05B19/18
- IPC分类号： G05B19/18
摘要：
A substrate transfer robot sets an interference region in advance in the range of motion of the substrate transfer robot; stores a plurality of patterns of a combination of a starting position, a target position, and the interference region, the starting position and the target position being among taught positions; determines which pattern among the plurality of patterns a movement of the substrate transfer robot from the starting position to the target position matches when the substrate transfer robot moves between the plurality of taught positions; and determines a movement path from the starting position to the target position so as to avoid the interference region in accordance with the determined pattern so that the substrate transfer robot avoids the interference region.