发明申请
- 专利标题: Silicon Drift X-Ray Detector
- 专利标题(中): 硅漂移X射线探测器
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申请号: US12646496申请日: 2009-12-23
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公开(公告)号: US20100163742A1公开(公告)日: 2010-07-01
- 发明人: Toshiyoshi WATANABE , Kouji Miyatake
- 申请人: Toshiyoshi WATANABE , Kouji Miyatake
- 申请人地址: JP Tokyo
- 专利权人: JEOL LTD.
- 当前专利权人: JEOL LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-330339 20081225
- 主分类号: G01T1/24
- IPC分类号: G01T1/24 ; G01T1/36
摘要:
A silicon drift detector has an X-ray detection device, an electrode terminal subassembly for electrical connection, a Peltier device, and first and second shields formed between the electrode terminal subassembly and the Peltier device. The first shield is made of a material consisting chiefly of an element having an atomic number smaller than the average atomic numbers of the elements included in the material of the Peltier device. The second shield is made of a material consisting chiefly of an element having an atomic number greater than the atomic numbers of the elements included in the material of the Peltier device
公开/授权文献
- US08648313B2 Silicon drift X-ray detector 公开/授权日:2014-02-11
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