发明申请
US20100178586A1 Novel Approach for Improved Stability and Performance of SOFC Metallic Interconnects
有权
改进SOFC金属互连的稳定性和性能的新方法
- 专利标题： Novel Approach for Improved Stability and Performance of SOFC Metallic Interconnects
- 专利标题（中）： 改进SOFC金属互连的稳定性和性能的新方法
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申请号： US12353816申请日： 2009-01-14
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公开(公告)号： US20100178586A1公开(公告)日： 2010-07-15
- 发明人: Zhenguo Yang , Jeffry W. Stevenson , Guan-Guang Xia
- 申请人： Zhenguo Yang , Jeffry W. Stevenson , Guan-Guang Xia
- 主分类号： H01M8/02
- IPC分类号： H01M8/02 ; C07F17/00 ; B32B33/00
摘要：
The present invention provides a material and a method for its creation and use wherein a reactive element, preferably a rare earth element, is included in an oxide coating material. The inclusion of this material modifies the growth and structure of the scale beneath the coating on metal substrate and improves the scale adherence to the metal substrate.
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