发明申请
US20100182586A1 LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING DEVICE USING SAME
审中-公开
平版印刷装置以及使用其制造装置的方法
- 专利标题： LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING DEVICE USING SAME
- 专利标题（中）： 平版印刷装置以及使用其制造装置的方法
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申请号： US12689002申请日： 2010-01-18
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公开(公告)号： US20100182586A1公开(公告)日： 2010-07-22
- 发明人: Takashi Ogura
- 申请人： Takashi Ogura
- 申请人地址： JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人： CANON KABUSHIKI KAISHA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-009050 20090119
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; H01L21/677 ; H01L21/673
摘要：
The Lithography apparatus of the present invention includes a container conveyance unit configured to convey a sealed container accommodating a substrate from the exterior of the apparatus to the interior of the apparatus, an opener provided in the interior of the lithography apparatus for opening and closing a front door of the sealed container, and a substrate conveyance unit configured to convey the substrate accommodated in the sealed container to a processing section. The container conveyance unit is extendable and retractable so as to be accommodated in the interior of the apparatus when the sealed container is conveyed from the exterior of the apparatus to the interior of the apparatus.
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