发明申请
- 专利标题: ELECTROSTATIC CHUCK SYSTEM AND PROCESS FOR RADIALLY TUNING THE TEMPERATURE PROFILE ACROSS THE SURFACE OF A SUBSTRATE
- 专利标题(中): 静电切割系统和用于辐射调整衬底表面温度曲线的工艺
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申请号: US12696119申请日: 2010-01-29
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公开(公告)号: US20100193501A1公开(公告)日: 2010-08-05
- 发明人: Martin L. Zucker , Daniel J. Devine , Young Jai Lee
- 申请人: Martin L. Zucker , Daniel J. Devine , Young Jai Lee
- 申请人地址: US CA Fremont
- 专利权人: MATTSON TECHNOLOGY, INC.
- 当前专利权人: MATTSON TECHNOLOGY, INC.
- 当前专利权人地址: US CA Fremont
- 主分类号: H05B3/68
- IPC分类号: H05B3/68
摘要:
An electrostatic chuck system for maintaining a desired temperature profile across the surface of the substrate is disclosed. The electrostatic chuck system includes a pedestal support defining a substantially uniform temperature profile across the surface of the pedestal support and an electrostatic chuck supported by the pedestal support. The electrostatic chuck has a clamping electrode and a plurality of independently controlled heating electrodes. The independently controlled heating electrodes include an inner heating electrode defining an inner heating zone and a peripheral heating electrode defining a peripheral heating zone separated by a gap distance. The temperature profile across the surface of the substrate can be tuned by varying thermal characteristics of the pedestal thermal zone, the inner heating zone, the peripheral heating zone, or by varying the size of the gap distance between the inner heating electrode and the peripheral heating electrode.