发明申请
- 专利标题： SOLID-STATE IMAGING DEVICE, METHOD FOR MANUFACTURING THE SAME, AND IMAGING APPARATUS
- 专利标题（中）： 固态成像装置，其制造方法和成像装置
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申请号： US12598691申请日： 2007-08-20
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公开(公告)号： US20100193669A1公开(公告)日： 2010-08-05
- 发明人: Tetsuji Yamaguchi , Yuko Ohgishi , Takashi Ando , Harumi Ikeda
- 申请人： Tetsuji Yamaguchi , Yuko Ohgishi , Takashi Ando , Harumi Ikeda
- 申请人地址： JP Tokyo
- 专利权人： SONY CORPORATION
- 当前专利权人： SONY CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-122370 20070507
- 国际申请： PCT/JP2007/066116 WO 20070820
- 主分类号： H01L27/146
- IPC分类号： H01L27/146 ; H01L31/18
摘要：
Realization of an adequate hole accumulation layer and reduction in dark current are allowed to become mutually compatible. A solid-state imaging device 1 having a light-receiving portion 12 to photoelectrically convert incident light is characterized by including a film 21, which is disposed on a light-receiving surface 12s of the above-described light-receiving portion 12 and which lowers an interface state, and a film 22, which is disposed on the above-described film 21 to lower the interface state and which has a negative fixed charge, wherein a hole accumulation layer 23 is disposed on the light-receiving surface 12s side of the light-receiving portion 12.
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