发明申请
US20100193795A1 LARGE-GRAIN CRYSTALLINE THIN-FILM STRUCTURES AND DEVICES AND METHODS FOR FORMING THE SAME 有权
大晶粒薄膜薄膜结构及其形成方法及其形成方法

LARGE-GRAIN CRYSTALLINE THIN-FILM STRUCTURES AND DEVICES AND METHODS FOR FORMING THE SAME
摘要:
Methods for forming semiconductor devices include providing a crystalline template having an initial grain size, annealing the crystalline template, the annealed template having a final grain size larger than the initial grain size, forming a buffer layer over the annealed template, and forming a semiconductor layer over the buffer layer.
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