发明申请
- 专利标题： DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS
- 专利标题（中）： 可开发的底部抗反射涂料组合物特别适用于离子植入应用
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申请号： US12363913申请日： 2009-02-02
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公开(公告)号： US20100196825A1公开(公告)日： 2010-08-05
- 发明人: Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
- 申请人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
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