发明申请
- 专利标题： PHOTORESIST COMPOSITIONS AND METHODS OF USE
- 专利标题（中）： 光电组合物和使用方法
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申请号： US12369150申请日： 2009-02-11
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公开(公告)号： US20100203450A1公开(公告)日： 2010-08-12
- 发明人: Masaki Fujiwara , Hiroshi Ito , Kazuhiro Yamanaka
- 申请人： Masaki Fujiwara , Hiroshi Ito , Kazuhiro Yamanaka
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
A photoresist composition comprises a polymer capable of radiation induced main chain scission and acid-catalyzed deprotection, wherein the polymer is derived by free radical polymerization of two or more monomers, each having an alpha-substituent on a polymerizable vinyl group; and a photochemical acid generator.
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