发明申请
- 专利标题: Light Emitting Device and Method of Manufacturing the Same
- 专利标题(中): 发光装置及其制造方法
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申请号: US12728377申请日: 2010-03-22
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公开(公告)号: US20100213492A1公开(公告)日: 2010-08-26
- 发明人: Si-Chen Lee , Yu-Wei Jiang , Yi-Ting Wu , Ming-Wei Tsai , Pei-En Chang
- 申请人: Si-Chen Lee , Yu-Wei Jiang , Yi-Ting Wu , Ming-Wei Tsai , Pei-En Chang
- 申请人地址: TW Taipei City
- 专利权人: NATIONAL TAIWAN UNIVERSITY
- 当前专利权人: NATIONAL TAIWAN UNIVERSITY
- 当前专利权人地址: TW Taipei City
- 优先权: TW99107890 20100317
- 主分类号: H01L33/48
- IPC分类号: H01L33/48 ; H01L33/00
摘要:
A light emitting device for generating infrared light includes a substrate, a first metal layer, a dielectric layer and a second metal layer. The substrate has a first surface. The first metal layer is formed on the first surface of the substrate. The dielectric layer is formed on the first metal layer. A thickness of the dielectric layer is greater than a particular value. The second metal layer is formed on the dielectric layer. When the light emitting device is heated, the dielectric layer has a waveguide mode such that the infrared light generated by the light emitting device can be transmitted in the dielectric layer. A wavelength of the infrared light generated in the waveguide mode relates to the thickness of the dielectric layer.
公开/授权文献
- US08242527B2 Light emitting device and method of manufacturing the same 公开/授权日:2012-08-14
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