发明申请
US20100220760A1 NITRIDE SEMICONDUCTOR LASER DEVICE 有权
氮化物半导体激光器件

  • 专利标题: NITRIDE SEMICONDUCTOR LASER DEVICE
  • 专利标题(中): 氮化物半导体激光器件
  • 申请号: US12711795
    申请日: 2010-02-24
  • 公开(公告)号: US20100220760A1
    公开(公告)日: 2010-09-02
  • 发明人: Takashi MIYOSHITakeshi OKADA
  • 申请人: Takashi MIYOSHITakeshi OKADA
  • 申请人地址: JP Anan-shi
  • 专利权人: NICHIA CORPORATION
  • 当前专利权人: NICHIA CORPORATION
  • 当前专利权人地址: JP Anan-shi
  • 优先权: JP2009-45398 20090227; JP2010-23003 20100204
  • 主分类号: H01S5/00
  • IPC分类号: H01S5/00
NITRIDE SEMICONDUCTOR LASER DEVICE
摘要:
The nitride semiconductor laser device includes a substrate, a nitride semiconductor layer having a first nitride semiconductor layer, an active layer, and a second nitride semiconductor layer stacked in this order on the substrate, and a ridge provided on a surface of the nitride semiconductor layer. The surface of the nitride semiconductor layer includes a generally flat part and first and second grooves which extend along the ridge in a resonator direction, the first groove being formed continuous to a first side surface of the ridge, the second groove being formed continuous to a second side surface of the ridge which is opposite to the first side surface
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