发明申请
- 专利标题： PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
- 专利标题（中）： 感光性组合物，使用感光性组合物的图案形成方法和化合物用于感光性组合物
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申请号： US12679140申请日： 2008-09-18
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公开(公告)号： US20100233617A1公开(公告)日： 2010-09-16
- 发明人: Kenji Wada
- 申请人： Kenji Wada
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-245332 20070921; JP2008-009840 20080118
- 国际申请： PCT/JP2008/066887 WO 20080918
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; C07C309/63 ; C08F14/18 ; C07C233/00 ; C08G75/00 ; C07C311/00
摘要：
A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.
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