发明申请
US20100237320A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
非易失性半导体存储器件及其制造方法

  • 专利标题: NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
  • 专利标题(中): 非易失性半导体存储器件及其制造方法
  • 申请号: US12726635
    申请日: 2010-03-18
  • 公开(公告)号: US20100237320A1
    公开(公告)日: 2010-09-23
  • 发明人: Hiroyuki Nagashima
  • 申请人: Hiroyuki Nagashima
  • 申请人地址: JP Tokyo
  • 专利权人: Kabushiki Kaisha Toshiba
  • 当前专利权人: Kabushiki Kaisha Toshiba
  • 当前专利权人地址: JP Tokyo
  • 优先权: JP2009-069788 20090323
  • 主分类号: H01L45/00
  • IPC分类号: H01L45/00 H01L21/82
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要:
A nonvolatile semiconductor memory device includes a memory cell array where a plurality of memory cell layers having a plurality of first and second wires which cross each other and a memory cell provided at each intersection of these first and second wires are laminated on top of each other, wherein the memory cells have a variable resistance element and a non-ohmic element laminated in the direction in which the memory cell layers are laminated and tapered in such a manner that the area in a cross section gradually becomes smaller from the bottom memory cell layer towards the top memory cell layer, and the variable resistance element and the non-ohmic element in the memory cells in a certain memory cell layer are laminated in the same order as the variable resistance element and the non-ohmic element of the memory cells in another memory cell layer.
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