发明申请
- 专利标题: PROCESS AND APPARATUS FOR THE INTRODUCTION AND REMOVAL OF A SUBSTRATE INTO AND FROM A VACUUM COATING UNIT
- 专利标题(中): 将基材引入和除去真空涂料单元的方法和装置
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申请号: US12665953申请日: 2008-06-23
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公开(公告)号: US20100239762A1公开(公告)日: 2010-09-23
- 发明人: Dietmar Schulze , Hans-Christian Hecht , Jochen Krause , Michael Hofmann
- 申请人: Dietmar Schulze , Hans-Christian Hecht , Jochen Krause , Michael Hofmann
- 申请人地址: DE Dresden
- 专利权人: VON ARDENNE Anlagentechnik GmbH
- 当前专利权人: VON ARDENNE Anlagentechnik GmbH
- 当前专利权人地址: DE Dresden
- 优先权: DE102007029286.6 20070622
- 国际申请: PCT/EP2008/057969 WO 20080623
- 主分类号: B05D1/00
- IPC分类号: B05D1/00 ; C23C14/56
摘要:
An apparatus is provided for introduction and/or removal of a substrate into and/or from a process chamber of a vacuum coating unit that includes a process region adjoined by a lock chamber separable from surrounding atmosphere and from the process region by vacuum-tight lock gates. The process region encompasses a process chamber and a transfer chamber for altering transport speed. A vacuum-tight gate on the inlet side of a lock system is opened, the substrate is transported into the lock system and the gate is closed. Pressure in the lock system is subsequently matched to pressure in a subsequent space. An outlet-side gate of the lock system is opened and the substrate is transported from the lock system. The lock system includes a lock chamber and the adjoining transfer chamber. A passage between the transfer chamber and lock chamber remains open during introduction or removal of the substrate.
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