发明申请
US20100239985A1 Method for Using Compositions Containing Fluorocarbinols in Lithographic Processes 有权
在平版印刷方法中使用含有氟代甲醇的组合物的方法

Method for Using Compositions Containing Fluorocarbinols in Lithographic Processes
摘要:
The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
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