发明申请
- 专利标题: PROCESS FOR PREPARING SILICON DIOXIDE DISPERSIONS
- 专利标题(中): 制备二氧化硅分散体的方法
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申请号: US12741378申请日: 2008-11-20
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公开(公告)号: US20100242801A1公开(公告)日: 2010-09-30
- 发明人: Wolfgang Lortz , Werner Will , Sascha Reitz , Gabriele Perlet
- 申请人: Wolfgang Lortz , Werner Will , Sascha Reitz , Gabriele Perlet
- 申请人地址: DE Essen
- 专利权人: Evonik Degussa GmbH
- 当前专利权人: Evonik Degussa GmbH
- 当前专利权人地址: DE Essen
- 优先权: DE102007059861.2 20071212
- 国际申请: PCT/EP08/65917 WO 20081120
- 主分类号: C04B14/04
- IPC分类号: C04B14/04 ; C01B33/141
摘要:
Process for preparing an alkaline dispersion of aggregated silicon dioxide particles by dividing a preliminary dispersion within a pH of 3 to 5 into at least two streams, placing these streams under a pressure of at least 50 bar and depressurizing them to a collision point, each via one nozzle, in a grinding chamber, and admixing the dispersion that runs off at the bottom, while still in the grinding chamber, with an alkaline substance in an amount such that the dispersion overall has a pH of more than 7.
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