发明申请
US20100252176A1 METHOD FOR FORMING GATE STRUCTURES 有权
形成门结构的方法

METHOD FOR FORMING GATE STRUCTURES
摘要:
A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.
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