发明申请
- 专利标题: METHOD FOR FORMING GATE STRUCTURES
- 专利标题(中): 形成门结构的方法
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申请号: US12665094申请日: 2008-05-20
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公开(公告)号: US20100252176A1公开(公告)日: 2010-10-07
- 发明人: Jeffrey H. Tokie , Michael A. Haase , Robert J. Schubert , Michael W. Bench , Donald J. McClure , Grace L. Ho
- 申请人: Jeffrey H. Tokie , Michael A. Haase , Robert J. Schubert , Michael W. Bench , Donald J. McClure , Grace L. Ho
- 国际申请: PCT/US08/64181 WO 20080520
- 主分类号: C25D7/00
- IPC分类号: C25D7/00 ; C25D11/02
摘要:
A process for forming gate structures is described. A web comprises a substrate, a plurality of conductive elements disposed on the substrate, and a conductive anodization bus. The web is moved through an anodization station to form a plurality of gate structures comprising a plurality of gate dielectrics adjacent to a plurality of gate electrodes. A process for forming electronic devices further providing a semiconductor, a source electrode, and a drain electrode is described.
公开/授权文献
- US08318552B2 Method for forming gate structures 公开/授权日:2012-11-27
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