发明申请
- 专利标题: METAMATERIAL STRUCTURE HAVING NEGATIVE PERMITTIVITY, NEGATIVE PERMEABILITY, AND NEGATIVE REFRACTIVITY
- 专利标题(中): 具有负极限性,负性渗透性和负反射性的金属结构
-
申请号: US12808106申请日: 2008-11-26
-
公开(公告)号: US20100259345A1公开(公告)日: 2010-10-14
- 发明人: Dongho Kim , Wangjoo Lee , Jae-Ick Choi
- 申请人: Dongho Kim , Wangjoo Lee , Jae-Ick Choi
- 申请人地址: KR Daejeon-city
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon-city
- 优先权: KR10-2007-0131029 20071214
- 国际申请: PCT/KR2008/006950 WO 20081126
- 主分类号: H01P3/18
- IPC分类号: H01P3/18
摘要:
Provided is an unlimited single-layer metamaterial structure having negative permittivity and negative permeability in a frequency bandwidth desired by a user. The metamaterial structure includes: a dielectric having a single layer structure having a permittivity or a multi-layer structure in which at least one layer has a different permittivity; and a single conductor disposed in the dielectric, wherein the metamaterial structure has a permittivity, a permeability, and a refractivity that have 0 or a negative value in a predetermined frequency band.
信息查询