发明申请
- 专利标题： MAGNETIC STACK STRUCTURE AND MANUFACTURING METHOD THEREOF
- 专利标题（中）： 磁性堆叠结构及其制造方法
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申请号： US12499802申请日： 2009-07-09
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公开(公告)号： US20100266873A1公开(公告)日： 2010-10-21
- 发明人: Te-Ho WU , Lin-Hsiu YE , Ching-Ming LEE
- 申请人： Te-Ho WU , Lin-Hsiu YE , Ching-Ming LEE
- 申请人地址： TW Yunlin County
- 专利权人： NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- 当前专利权人： NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- 当前专利权人地址： TW Yunlin County
- 优先权： TW98112666 20090416
- 主分类号： G11B5/62
- IPC分类号： G11B5/62 ; B05D5/00
摘要：
A magnetic stack structure is disclosed. The magnetic stack structure includes two metal layers and a free layer sandwiched by the two metal layers. The thickness of the free layer is 1-30 nm. The thickness of the metal layers are 0.1-20 nm respectively.
公开/授权文献
- US08435652B2 Magnetic stack structure and manufacturing method thereof 公开/授权日：2013-05-07
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